People are always asking “What should I expect when I start designing at 20nm using double patterning?” It’s a good question, but in many real aspects, the answer is “It depends,” and that is not very ...

The challenges of double pattering (DP)-based design are looming large to those customers starting to move to the 20 nm technology node. Of course, much of the fear and trepidation is simply due to it ...

Double patterning is a class of technologies developed for photolithography to enhance the feature density of computer chips. The resolution of a photoresist pattern begins to blur at around 45 nm ...

TSMC is planning to adopt double patterning extensively at 20nm, despite the high cost of doing so. Why? Because EUV hasn't come through. Share on Facebook (opens in a new window) Share on X (opens in ...

The big joke about extreme ultraviolet (EUV) technology is that it takes seven trucks to deliver the mammoth tools compared to one for other advanced lithography tools — but actually, this is no joke.