Microstructural characterization of BaTiO3 thin films prepared by RF-Magnetron sputtering using sintered targets from high energy ball milled powders The electronic and optical characteristics of ...

The confocal sputtering technique involves the arrangement of magnetrons inside a vacuum chamber so that it is possible to apply multiple materials onto the substrate without breaking vacuum. This ...

Dublin, July 15, 2025 (GLOBE NEWSWIRE) -- The "Magnetron Sputter Film Market Outlook 2025-2034: Market Share, and Growth Analysis By Product Type (Metal Films, Alloy Films, Dielectric Films), By ...

The planar magnetron is a typical diode mode sputtering cathode consisting of a permanent magnet array behind it. This magnet array is organized in such a fashion to provide a magnetic field that is ...

Sputtering Technique Sputtering is a process wherein a controlled gas, typically chemically inert argon, is introduced into a vacuum chamber and then a cathode is electrically energized to generate a ...